Bossmen-Precision Clean Nanoscale Photomask Storage Cabinet

[Bossmen-Precision Clean Nanoscale Photomask Storage Cabinet] Specifications:

Photomask is an interface mold for converting various circuit design patterns of integrated circuits into wafer production. It is an important role for circuit design patterns to be reverse-printed on wafers after exposure and exposure.

Once the quality of the mask is defective, it will always be copied to the die of the wafer, which directly affects the yield of the wafer. As the lithography pattern becomes finer, the risk of reticle contamination and yield loss increases.

Due to the delicate and easily damaged characteristics of the photomask coating, foreign dust and chemical residues are potential sources of contamination.

In addition to the quality of the reticle manufacturing, the way it is stored is also very important.

Generally, the photomask storage box is stored in a clean and airtight nitrogen cabinet, because nitrogen can not only remove chemical pollution on the photomask, but also maintain a proper humidity environment. Bossmen photomask storage nitrogen cabinet not only provides clean and dry photomask storage space, but also has an energy-saving design, which saves more than 80% of nitrogen consumption compared to traditional nitrogen cabinets, and the visual temperature and humidity display improves the reliability of storage.