Dust-Free Reticle Storage System, High-Efficiency Clean Reticle Storage Cabinet

Nanoscale Reticle Pod Nitrogen Cabinet, providing a stable and dust-free storage environment for reticles.

Nanoscale Reticle Pod Nitrogen Cabinet - Nanoscale Reticle Pod Nitrogen Cabinet, providing a stable and dust-free storage environment for reticles.
  • Nanoscale Reticle Pod Nitrogen Cabinet - Nanoscale Reticle Pod Nitrogen Cabinet, providing a stable and dust-free storage environment for reticles.

Nanoscale Reticle Pod Nitrogen Cabinet

BM1238, BM1273

Dust-Free Reticle Storage System, High-Efficiency Clean Reticle Storage Cabinet

Designed for advanced semiconductor and EUV photomask storage, this cabinet provides a Class 1 clean, low-humidity nitrogen environment to protect masks from contamination, damage, and oxidation.

With automated XCDA airflow, oxygen-based FFU control, and multi-layer nitrogen distribution, it ensures stable storage conditions. Integrated ULPA filtration and real-time humidity / temperature monitoring safeguard mask quality.
Ideal for EUV, logic and memory fabs, advanced packaging, and MEMS. Modular and energy-efficient, it’s a key solution for high-yield, high-reliability production.

Features
  • Material and Design: Made of stainless steel SUS 304 with a polished surface, offering corrosion resistance. Equipped with a glass window, high-load brake wheels, and leveling feet to provide a stable and durable structural design.
  • Nitrogen Flow Adjustment: The air intake source can be chosen between nitrogen and XCDA (dry air), providing flexible gas source options.
  • Reticle Storage and Access Management: Equipped with access control card readers and an RFID programmable system to effectively manage reticle storage and retrieval operations, improving security and accuracy.
  • Independent Nitrogen Flow Monitoring: Each reticle pod can independently monitor the nitrogen flow and report data, utilizing an eco-friendly energy-saving design to reduce unnecessary nitrogen consumption.
  • Cabinet Design: Equipped with ULPA filters and chemical filters, featuring a positive pressure dustproof clean design to effectively prevent contaminants from entering.
  • Temperature and Humidity Monitoring: Allows for setting, recording, alarming, and offset calibration of temperature and humidity, with a humidity adjustment range of 5%-60% RH.
  • Alarm Function: When there is an abnormality during the placement or removal of reticle pods, the system will trigger an alarm and record the event to ensure proper operation.
  • Safety Mode: Equipped with alarms for door-open time exceeding limits, high humidity, and excessive oxygen concentration, providing comprehensive safety protection.
  • Power Specifications: Supports 110V/240V, 50-60Hz power supply, meeting international standards and suitable for various industrial needs.
  • Gas Supply System: When the FFU airflow is activated, the XCDA intake automatically starts, ensuring dry air flows into the system.
  • Nitrogen (N2) Intake and Confirmation: Nitrogen passes through the nitrogen purifier and is then distributed into each reticle pod in layers. The outlet pipe is equipped with temperature and humidity sensors to monitor nitrogen flow and ensure stable storage conditions for the photomasks.
  • Programmable Filter Fan Unit (FFU): The FFU activation condition is set based on oxygen concentration levels, ensuring precise air filtration and circulation.
  • Chemical Filter: Effectively filters out chemical contaminants such as carbonate ions, sulfides, and ammonia in the dry air, protecting photomasks from pollution.
  • Air Filter (ULPA): Capable of filtering ultrafine particles, achieving Class 1 cleanliness level, providing a dust-free environment.
  • Nitrogen Purifier: Filters out chemical contaminants such as carbonate ions, sulfides, and ammonia from nitrogen, ensuring the storage environment remains in its purest state.
Benefit
  • Nanoscale Clean Storage Environment to Protect Photomask Quality: Equipped with an ULPA high-efficiency filtration system, achieving Class 1 cleanliness, effectively isolating airborne particles and contaminants to ensure photomasks remain unaffected by external environmental factors during storage.
  • Automated Gas Control for Stable Humidity and Cleanliness: The XCDA automatic intake and nitrogen purification distribution design, combined with temperature, humidity sensors, and O₂ concentration control, continuously monitors and adjusts storage conditions to prevent photomask degradation due to moisture or oxygen exposure.
  • Energy-Efficient Operation to Reduce Nitrogen Consumption: The built-in intelligent FFU control system activates based on real-time oxygen concentration, and the modular design optimizes airflow paths, maximizing nitrogen savings and energy efficiency.
Product Specifications
ModelNanoscale Reticle Pod Nitrogen Cabinet
BM1283-2
Nanoscale Reticle Pod Nitrogen Cabinet
BM1273
External Dimensions (mm)W2800 x H2150 x D750W1800 x H2071 x D550
Stored ContentsRSP200 or EVU POD
Temperature Display0.1°C ~ 99.9°C ± 1°C
Humidity Control Range5%RH ~ 60% ± 3%RH
Capacity40PCS8PCS
Voltage110V/240V
Frequency50Hz/60Hz
Gallery

Nanoscale Reticle Pod Nitrogen Cabinet – Precision Humidity Control by BOSSMEN

The Nanoscale Reticle Pod Nitrogen Cabinet is designed to protect sensitive materials, electronics, and instruments from moisture damage. BOSSMEN integrates advanced humidity control systems to maintain stable RH levels, ensuring reliability in manufacturing, laboratories, and research facilities.

Engineered with precision and durability, the Nanoscale Reticle Pod Nitrogen Cabinet offers consistent performance for long-term storage and process environments. From cleanrooms to quality labs, BOSSMEN products help users reduce corrosion, oxidation, and ESD risks while maintaining compliance with strict environmental standards.

Discover how the Nanoscale Reticle Pod Nitrogen Cabinet enhances productivity and preservation in your workflow. Each unit reflects BOSSMEN’s thirty years of humidity control expertise, combining innovation, safety, and measurable value for industrial and laboratory applications.